Sealant bond strength with self-etching systems in contaminated conditions

Objectives: To evaluate the influence of the light curing moment of two self-etching adhesive systems in the shear bond strength of a sealant to enamel, in salivary contamination conditions. Methods: Dental sealant (Delton, Dentsply) was applied to sixty human incisors vestibular enamel with Xeno III (Dentsply) or Prompt-L-Pop (3M/Espe). After the application of the adhesive system and before the application of the sealant, all specimens were submitted to saliva contamination. The light curing moment determined the further division of the specimens. Thus, four experimental groups were created according to all possible combinations between the two variables (n=15). In one group, the adhesive system was cured with the sealant (co-polymerization), and in the other, light cured independently (independent polymerization). Shear bond strength tests were done with an universal testing machine. Data was analyzed with a two-way ANOVA. Results: There were no statistical differences (p=0,267) between the two adhesive systems tested (Xeno III - 29,7+/-7,4MPa; Prompt-L-Pop - 31,8+/-8,2MPa). The co-polymerization groups (33,3+/-9,4MPa) yielded statistically (p=0,01) higher shear bond strength values than the independent polymerization groups (28,2+/-4,7MPa). Conclusions: In saliva contamination conditions, the co-polymerization of the adhesive systems and the sealant yielded higher bond strength values to enamel than the isolated polymerization of the components. Even with saliva contamination, the self-etching adhesive systems used yielded high shear bond strength values. (Study performed at UICOB, FCT R&D unit 4062).