IADR Abstract Archives
Roughness and Gloss Evaluation of Different Lithium Disilicate Ceramics
Objectives: To evaluate the surface roughness and gloss of different lithium disilicate ceramics prior to and after surface polishing.
Methods: Twenty rectangular-shaped discs (6x4x3 mm) were obtained from LiSi blocks of different manufacturers [Initial LiSi Block (ILiSi; GC Corp.), Cerec Tessera (CT; Dentsply Sirona), e-max CAD (EM; Ivoclar)] by means of a diamond blade (Remet) under water cooling. Each disc was marked with an indelible pencil on one side to standardize the measurements. Surface roughness and gloss were measured with a profilometer (SJ-201, Mitutoyo) and a glossmeter (KSJ Photoelectrical Instruments Co., MG6 S1 60 degree), respectively. A silicone mold was used to standardize measurements which were repeated three times per each disc (T0). The specimens were then polished with #1200 and #4000 SiC papers under water cooling, after which the measurements were repeated (Tpolish). Data were collected in a custom-made Excel file and statistically analyzed (p<0.05).
Results: All materials reported significantly lower roughness values after polishing procedures p<0.05 (CT: 1.574 T0 – 1.149 Tpolish; ILiSi: 1.194 T0 – 0.902 Tpolish; EM: 1.007 T0 0.846 Tpolish). At T0 similar results were reported between EM and ILiSi (p>0.05) while CT resulted in higher roughness values (p<0.01). At Tpolish EM and ILiSi remained comparable to each other (p>0.05), while CT demonstrated higher roughness compared to EM (p=0.013) but no longer to ILiSi (p=0.056).
In addition, all materials reported significantly higher gloss values after polishing procedures (p<0.05) (CT: 3.083 T0 – 15.883 Tpolish; ILiSi: 2.817 T0 – 20.183 Tpolish; EM: 5.333 T0 11.200 Tpolish) No significant differences were reported within materials at T0 (p>0.05) while at Tpolish ILiSi resulted in higher gloss values compared to EM (p=0.005).
Conclusions: The tested materials showed different surface properties. Initial LiSi Block showed similar roughness and higher gloss after polishing procedures, particularly compared to Emax CAD.
Methods: Twenty rectangular-shaped discs (6x4x3 mm) were obtained from LiSi blocks of different manufacturers [Initial LiSi Block (ILiSi; GC Corp.), Cerec Tessera (CT; Dentsply Sirona), e-max CAD (EM; Ivoclar)] by means of a diamond blade (Remet) under water cooling. Each disc was marked with an indelible pencil on one side to standardize the measurements. Surface roughness and gloss were measured with a profilometer (SJ-201, Mitutoyo) and a glossmeter (KSJ Photoelectrical Instruments Co., MG6 S1 60 degree), respectively. A silicone mold was used to standardize measurements which were repeated three times per each disc (T0). The specimens were then polished with #1200 and #4000 SiC papers under water cooling, after which the measurements were repeated (Tpolish). Data were collected in a custom-made Excel file and statistically analyzed (p<0.05).
Results: All materials reported significantly lower roughness values after polishing procedures p<0.05 (CT: 1.574 T0 – 1.149 Tpolish; ILiSi: 1.194 T0 – 0.902 Tpolish; EM: 1.007 T0 0.846 Tpolish). At T0 similar results were reported between EM and ILiSi (p>0.05) while CT resulted in higher roughness values (p<0.01). At Tpolish EM and ILiSi remained comparable to each other (p>0.05), while CT demonstrated higher roughness compared to EM (p=0.013) but no longer to ILiSi (p=0.056).
In addition, all materials reported significantly higher gloss values after polishing procedures (p<0.05) (CT: 3.083 T0 – 15.883 Tpolish; ILiSi: 2.817 T0 – 20.183 Tpolish; EM: 5.333 T0 11.200 Tpolish) No significant differences were reported within materials at T0 (p>0.05) while at Tpolish ILiSi resulted in higher gloss values compared to EM (p=0.005).
Conclusions: The tested materials showed different surface properties. Initial LiSi Block showed similar roughness and higher gloss after polishing procedures, particularly compared to Emax CAD.