IADR Abstract Archives

Caries Infiltrant Contamination Affects Bond Strength of Adhesives to Dentin

Objective: The aim of this study was to analyse whether the contamination with a caries infiltrant system impairs the adhesive performance of etch&rinse and self-etching adhesives on dentin.

Methods: Dentin samples were allocated to 8 groups (each n = 10). The contamination of caries infiltrant system (Icon, DMG) was simulated by applying either hydrochloric acid (15% HCl, Icon Etch, 15 s), the resin infiltrant (Icon infiltrant, 4 min) or both prior to the application of the respective adhesives. In the control groups, the etch&rinse adhesive (Optibond FL, Kerr) and the self-etching adhesive (iBond Self Etch, Hereaus) were applied without former contamination with the infiltrant system. Shear bond strength of a nano-hybrid composite was analysed after thermo-cycling (5000x, 5o to 55oC) of the samples. Failure mode was inspected under stereomicroscope at 25× magnification. Data were statistically analysed by two-way ANOVA and Bonferroni-post hoc tests (p < 0.05).

Results: Contamination with hydrochloric acid or with hydrochloric acid and the resin infiltrant reduced shear bond strength (MPa) of the adhesives (Optibond FL: 20.5 ± 3.6, iBOND Self Etch: 17.9 ± 2.6) significantly, while the contamination with the resin infiltrant alone did not impair shear bond strength. Contamination with hydrochloric acid or with hydrochloric acid and the resin infiltrant increased the number of adhesive failures.

Conclusion: The contamination with the caries infiltrant system impaired the shear bond strength of conventional dental adhesives, while the contamination with hydrochloric acid, but not with the resin infiltrant alone was detrimental for the adhesive performance.

Division: IADR/LAR General Session
Meeting: 2012 IADR/LAR General Session (Iguaçu Falls, Brazil)
Location: Iguaçu Falls, Brazil
Year: 2012
Final Presentation ID: 1657
Abstract Category|Abstract Category(s): Dental Materials 1: Adhesion - Bond Strength Testing and Mechanisms
Authors
  • Jia, Liuhe  ( University of Zurich, Zurich, N/A, Switzerland )
  • Stawarczyk, Bogna  ( University of Zurich, Zurich, N/A, Switzerland )
  • Schmidlin, Patrick  ( University of Zurich, Zurich, N/A, Switzerland )
  • Attin, Thomas  ( University of Zurich, Zurich, N/A, Switzerland )
  • Wiegand, Annette  ( University of Zurich, Zurich, N/A, Switzerland )
  • Tawakoli, Pune  ( University of Zurich, Zurich, N/A, Switzerland )
  • SESSION INFORMATION
    Poster Session
    Adhesion, Bond Strength, and Durability II
    06/22/2012