IADR Abstract Archives

Plasma Based Fluorine Ion Implantation in Surfaces of Dental Materials

Objectives:Appliances such as space maintainer and space regainer for occlusal guidance, orthodontic appliance, denture and others are apt to adhere oral bacteria and to cause dental caries, periodontal disease or inflammation of oral soft tissue. Previous study has shown that the surfaces of dental materials modified by plasma based ion implantation (PBII) prevent adhesion of oral bacteria. The purpose of this study was to investigate the depth of fluorine ion implantation, contact angle and roughness of the surfaces of stainless steel (SUS316L), pure titanium (Ti) and polymethyl methacrylate (PMMA) modified by PBII. Methods:Fluorine gases for PBII were Ar+F2(5%fluorine) and CF4. Depth of fluorine ion implantation was measured with secondary ion mass spectrograph (Physical Electronics, ADEPT 1010), contact angle was measured with contact-angle meter (KYOWA KAIMENKAGAKU,CA-DT) and surface roughness was measured with Taylor Hobson(TALYSCAN). Each measurement was done before and after 30,000 times brushing under 200 g load with conventional tooth brush. Results:Depth of Ar+F2ion implantation was larger than CF4inSUS316L, same as CF4in Ti, and smaller than CF4 in PMMA. Depth of fluorine ion implantation was not changed after brushing. Contact angle and surface roughness were not different between Ar+F2 and CF4 and between before and after brushing. Conclusions:These results suggest that the depth of fluorine ion implantation is different between Ar+F2 and CF4gas in SUS316L,Ti and PMMA.Brushing dose not change the surface of these dental materials. This study was supported by JSPS.KAKENHI(14370697).
Division: IADR/AADR/CADR General Session
Meeting: 2004 IADR/AADR/CADR General Session (Honolulu, Hawaii)
Location: Honolulu, Hawaii
Year: 2004
Final Presentation ID: 113
Abstract Category|Abstract Category(s): Microbiology / Immunology and Infection Control
Authors
  • Nishino, Mizuho  ( Tokushima University, Tokushima, N/A, Japan )
  • Nurhaerani, Nurhaerani  ( Tokushima University, Tokushima, N/A, Japan )
  • Hibino, Yutaka  ( Ion Engineering Research Institute Corporation, Hirakata, N/A, Japan )
  • SESSION INFORMATION
    Poster Discussion Session
    Microbiology & Immunology
    03/10/2004